{"ModuleCode":"ESP3102","ModuleTitle":"From Making Nano to Probing Nano","Department":"Engineering Science Programme","ModuleDescription":"The aims of this module are to provide a comprehensive coverage of a range of nanofabrication and characterization techniques. The fabrication part will facus on top-down techniques which will complement the bottom-up techniques covered by CM3251 Nanochemistry. Topics to be covered include: Nanofabrication: thin flim deposition, etching, photolithography, EUV, electron beam, x-ray and ion beam lithography, focused ion beam and direct laser writing, scanning probe based techniques, fabrication and alignment of nanostructures, manufacturing of nanodevices and nanosystems. Nanocharacterization: basic principle of imaging, wave diffraction, interaction of energy beams with materials, optical and electron microscopy, scanning probe microscopy, x-ray microanalysis, electron transport measurement, magnetic measurement and optical spectroscopy.","ModuleCredit":"4","Workload":"3-0-0-1-6","Prerequisite":"PC2130B, PC2133","ExamDuration":"P2H","ExamVenue":"E3-06-05/06","Types":["Module"],"AcadYear":"2014/2015","History":[{"Semester":1,"ExamDate":"2014-11-25T17:00+0800","Timetable":[{"ClassNo":"1","LessonType":"Lecture","WeekText":"Every Week","DayText":"Tuesday","StartTime":"1000","EndTime":"1200","Venue":"TP-SR7"},{"ClassNo":"1","LessonType":"Lecture","WeekText":"Every Week","DayText":"Wednesday","StartTime":"1200","EndTime":"1300","Venue":"DV1"},{"ClassNo":"1","LessonType":"Tutorial","WeekText":"Every Week","DayText":"Wednesday","StartTime":"1300","EndTime":"1400","Venue":"DV1"}],"IVLE":[{"Announcements":null,"Forums":[],"Workbins":[],"Webcasts":[],"Gradebooks":[],"Polls":[],"Multimedia":[],"LessonPlan":[],"ID":"7df51d1e-bcb1-4fe8-b1b8-fe8faf937bf0","CourseLevel":"1","CourseCode":"ESP3102","CourseName":"FROM MAKING NANO TO PROBING NANO","CourseDepartment":"","CourseSemester":"Semester 1","CourseAcadYear":"2014/2015","CourseOpenDate":"/Date(1406995200000+0800)/","CourseOpenDate_js":"2014-08-03T00:00:00","CourseCloseDate":"/Date(1421510340000+0800)/","CourseCloseDate_js":"2015-01-17T23:59:00","CourseMC":"0","isActive":"N","Permission":"S","Creator":{"UserID":null,"Name":"Van Kan, Jeroen Anton","Email":null,"Title":null,"UserGuid":"625ede66-db5e-4e65-b3b0-4483730d8c35","AccountType":null},"hasGradebookItems":true,"hasTimetableItems":true,"hasGroupsItems":false,"hasClassGroupsForSignUp":false,"hasGuestRosterItems":true,"hasClassRosterItems":false,"hasWeblinkItems":false,"hasLecturerItems":true,"hasDescriptionItems":true,"hasReadingItems":false,"hasAnnouncementItems":false,"hasProjectGroupItems":false,"hasProjectGroupsForSignUp":false,"hasConsultationItems":false,"hasConsultationSlotsForSignUp":false,"hasLessonPlanItems":false,"Badge":0,"BadgeAnnouncement":0,"WebLinks":[],"Lecturers":[{"ID":"b796a855-0963-4b11-827b-6a8d458ea88c","User":{"UserID":null,"Name":"Ho Ghim Wei","Email":null,"Title":null,"UserGuid":"fd83c236-a0fa-4138-a8b4-168ea718215c","AccountType":null},"Role":"Lecturer ","Order":1,"ConsultHrs":null},{"ID":"0e21b00b-5f47-4108-82dc-de03ffa6bcb6","User":{"UserID":null,"Name":"Van Kan, Jeroen Anton","Email":null,"Title":null,"UserGuid":"625ede66-db5e-4e65-b3b0-4483730d8c35","AccountType":null},"Role":"Lecturer ","Order":2,"ConsultHrs":null}],"Descriptions":[{"ID":"1e5f053b-8835-4692-be49-41f07234cfff","Title":"Learning Outcomes","Description":"The aims of this module are to provide a comprehensive coverage of a range of nanofabrication and characterization techniques. The fabrication part will facus on top-down techniques which will complement the bottom-up techniques covered by CM3251 Nanochemistry. \n\n\n\nTopics to be covered include:\n\nNanofabrication: thin flim deposition, etching, photolithography, EUV, electron beam, x-ray and ion beam lithography, focused ion beam and direct laser writing, scanning probe based techniques, fabrication and alignment of nanostructures, manufacturing of nanodevices and nanosystems. \n\nNanocharacterization: basic principle of imaging, wave diffraction, interaction of energy beams with materials, optical and electron microscopy, scanning probe microscopy, x-ray microanalysis, electron transport measurement, magnetic measurement and optical spectroscopy.","Order":1},{"ID":"2e5f053b-8835-4692-be49-41f07234cfff","Title":"Prerequisites","Description":"PC2130B, PC2133","Order":2},{"ID":"4e5f053b-8835-4692-be49-41f07234cfff","Title":"Schedule","Description":"Lecture Tuesday 10-12 p.m.
\r\nLecture Wednesday 12-1 p.m.
\r\nTutorial Wednesday 1-2 p.m.","Order":4},{"ID":"6e5f053b-8835-4692-be49-41f07234cfff","Title":"Syllabus","Description":"Part 1
\r\nIntroduction to bottom up nano fabrication techniques. (1h)
\r\nPhysical chemistry of solid surfaces (2h)
\r\nMaking nano through vapor phase route (4h)
\r\nMaking nano through liquid & solid phases (3h)
\r\nProbing Nano-electron microscopy (3h)
\r\nProbing Nano-scanning probe microscopy (3h)
\r\n
\r\nPart 2
\r\nIntroduction to top down nano fabrication techniques (1h)
\r\nOptical lithography (2h)
\r\nElectron beam lithography (3h)
\r\nFocused Ion beam, SIMS (3h)
\r\nProton beam writing (1h)
\r\nRBS/PIXE Pattern transfer (2h)
\r\nX-ray Lithography (1hr)
\r\nReplication, Etching & Applications (3h)","Order":6},{"ID":"8e5f053b-8835-4692-be49-41f07234cfff","Title":"Assessment","Description":"
\r\n\tProject 1 (Lab practical and presentation): 20%
\r\n\tProject 2 ( Computer simulation & report): 20%
\r\n\t2 CA tests: 10% (each)
\r\n\tFinal exam: 40%